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Electronic Chemicals: Acids & Bases

KMG Electronic Chemicals offers the broadest line of semiconductor-grade wet chemicals in North America. We also supply major technology customers in Europe, the Middle East and Asia. With purities that extend to the parts-per-trillon (ppt) level, our high-quality acids and bases are used for cleaning formulations and other processes by semiconductor and wafer fabs throughout the world.

By vertically integrating ammonium hydroxide production, nitric acid distillation and hydrofluoric acid generation, we control the entire production process -- from assuring raw material quality to final packaging.  This process allows us to evaluate and enhance all processes continuously, so our products can help minimize defects and improve yield.

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Acetic Acid

Acetic acid is used in mixed acid etchants and in SEZ etchants. Acetic acid is used in place of water to help keep nitric acid from dissociating, which makes for a more oxidizing solutions.

Solution Container Type Download Datasheet
Acetic Acid Cleanroom® LP BOTTLE Download
Acetic Acid Cleanroom® LP DRUM Download

Hydrochloric Acid 37%

In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.

Solution Container Type Download Datasheet
Hydrochloric Acid 37% Cleanroom® MB BOTTLE Download
Hydrochloric Acid 37% Cleanroom® MB DRUM Download
Hydrochloric Acid 37% Cleanroom LP® BOTTLE Download
Hydrochloric Acid 37% Cleanroom LP® DRUM Download
Hydrochloric Acid 37% Gigabit® BOTTLE Download
Hydrochloric Acid 37% Gigabit® DRUM Download

Hydrofluoric Acid

Hydrofluoric acid is a critical chemistry in semiconductor processing. It is used to solubilize many oxides, particularly silicon dioxide, the most widely used insulator on semiconductor devices.

Solution Container Type Download Datasheet
Hydrofluoric Acid 49% Cleanroom® MB BOTTLE Download
Hydrofluoric Acid 49% Cleanroom® MB DRUM Download
Hydrofluoric Acid 49% Gigabit® BOTTLE Download
Hydrofluoric Acid 49% Gigabit® DRUM Download

Hydrofluoric Acid Dilutes

Dilute HF solutions transform a hydrophilic silicon surface to a hydrophobic surface by terminating the silicon surface with hydrogen. Dilute HF can be used to eliminate a silicon dioxide dielectric layer or to remove a metal contaminated native oxide.

Solution Container Type Download Datasheet
Hydrofluoric Acid 1:1 DRUM Download
Hydrofluoric Acid 5:1 DRUM Download
Hydrofluoric Acid 10:1 DRUM Download
Hydrofluoric Acid 30:1 BOTTLE Download
Hydrofluoric Acid 50:1 DRUM Download
Hydrofluoric Acid 100:1 BOTTLE Download

Nitric Acid 69.5%

Nitric acid is a strong oxidizing agent used to oxidize silicon to silicon dioxide and to dissolve metals to metal nitrates. Nitric acid is used in combination with hydrofluoric acid (HF) in mixed acid etchants to etch silicon.

Solution Container Type Download Datasheet
Nitric Acid 69.5% Cleanroom® LP BOTTLE Download
Nitric Acid 69.5% Cleanroom® MB DRUM Download
Nitric Acid 69.5% Gigabit® DRUM Download
Nitric Acid 69.5% Cleanroom® MB TOTE Download
Nitric Acid 69.5% Gigabit® TANKWAGON Download

Nitric Acid 97%-99% (Fuming)

Highly concentrated Nitric Acid 97% - 99% (Fuming) is used as a resist stripper. This product may also be used in cleaning applications.


Phosphoric Acid 80%

Phosphoric acid is used in silicon nitride etching. It is also used in aluminum etch, in which the phosphoric acid acts to dissolve aluminum oxide.

Solution Container Type Download Datasheet
Phosphoric Acid 80% Cleanroom® MB DRUM Download
Phosphoric Acid 85% Cleanroom® MB BOTTLE Download
Phosphoric Acid 85% Cleanroom® MB DRUM Download
Phosphoric Acid 85% Gigabit® DRUM Download

Sulfuric Acid

Sulfuric acid, our high purity process chemical offering, is used in piranha solutions for organic removal. It is available in bottles, drums, totes and bulk.

Solution Container Type Download Datasheet
Sulfuric Acid 96% Cleanroom® MB BOTTLE Download
Sulfuric Acid 96% Cleanroom® MB DRUM Download
Sulfuric Acid 96% Gigabit® BOTTLE Download
Sulfuric Acid 96% Gigabit® DRUM Download
Sulfuric Acid 96% Cleanroom® MB TOTE Download
Sulfuric Acid 96% Gigabit® TOTE Download
Sulfuric Acid 96% Gigabit® TANKWAGON Download

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Ammonium Hydroxide 29%

Ammonium hydroxide is used in a SC-1 solution to remove organics and particles from the surface of a wafer. The ammonium hydroxide allows undercutting of the silicon dioxide, freeing particles from the wafer by lift-off.

Solution Container Type Download Datasheet
Ammonium Hydroxide 29% Gigabit® TOTE Download
Ammonium Hydroxide 29% Gigabit® BOTTLE Download
Ammonium Hydroxide 29% Gigabit® DRUM Download
Ammonium Hydroxide 29% Cleanroom® LP BOTTLE Download
Ammonium Hydroxide 29% Cleanroom® MB DRUM Download
Ammonium Hydroxide 29% Terabit® DRUM Download

Potassium Hydroxide

Potassium hydroxide (KOH) is used to etch silicon. The crystalline orientation of the silicon greatly affects the etch rate, making potassium hydroxide an anistropic etchant.

Solution Container Type Download Datasheet
Potassium Hydroxide 45% Cleanroom® LP BOTTLE Download
Potassium Hydroxide 45% Cleanroom® LP DRUM Download

Sodium Hydroxide 50%

Sodium Hydroxide (NaOH) can be used to oxidize silicon to silicates. Further reaction with NaOH with these silicates forms water soluble species. Sodium hydroxide is also used in chemical mechanical polishing applications.

Solution Container Type Download Datasheet
Sodium Hydroxide 50% Cleanroom® LP BOTTLE Download