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Electronic Chemicals: Solvents & Solvent Blends

KMG Electronic Chemicals produces high-purity solvents and other wet process chemicals under a concept we call “basic manufacturing.” As a basic manufacturer, we are vertically integrated to meet the stringent standards of semiconductor, silicon wafer, disk drive and other applications that need the coherent manufacturing, analytical and packaging capabilities of a single supplier.

We supply solvents and solvent blends to many markets, including microelectronic, aerospace, biotechnology, pharmaceutical and optics, for such applications as:

  • Basic cleaning in semiconductor and related high-purity processes
  • Various etch-polishing processes
  • Ultra-low-residue vapor drying
  • Adhesion promoters for photoresists
  • Positive and negative photoresist stripping agents
  • Photoresist edge-bead-remover agents
  • High-purity intermediates for photoresist, spin-on-glass, low-k dielectric materials and anti-reflective coatings
  • Carriers for photoresist, abrasives, solvents and lubricants
  • Coolants, wetting agents and thickeners
Expand for Description and Associated Downloads
1,2-Ethylenediamine 40%

Ethylenediamine is used in anistropic silicon etchants to preferentially etch one silicon lattice, namely <100> and <110> over <111> crystalline orientation.

Solution Container Type Download Datasheet
1,2-Ethylenediamine 40% BOTTLE Download

Acetone

Acetone can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.

Solution Container Type Download Datasheet
Acetone Cleanroom® LP DRUM Download
Acetone Cleanroom® MB BOTTLE Download
Acetone Cleanroom® MB DRUM Download

Cyclohexanone

Cyclohexanone is used as a solvent for photoresist, an edge bead remover, and a general solvent for organic polymers resists.

Solution Container Type Download Datasheet
Cyclohexanone DRUM Download

Ethylene Glycol

Ethylene Glycol is a high purity process chemical for semiconductor rinse applications and in a high purity cooling system.

Solution Container Type Download Datasheet
Ethylene Glycol Gigabit® Drum Download
Ethylene Glycol Electronic BOTTLE Download
Ethylene Glycol Electronic DRUM Download
Ethylene Glycol 50% Cleanroom® LP DRUM Download

Hexamethyldisilazane (HMDS)

Hexamethyldisilazane (HMDS) is an adhesion promoter between photoresist and the silicon wafer.

Solution Container Type Download Datasheet
Hexamethyldisilazane (HMDS) Cleanroom® MB PINT Download
Hexamethyldisilazane (HMDS) Cleanroom® MB TOTE Download
Hexamethyldisilazane (HMDS) Cleanroom® MB BOTTLE Download

Isopropanol Dilutes

10% IPA is used as a cleaning agent and disinfectant. It is used as a general cleaning agent for computer screens, laptops, other electronic devices and general fab manufacturing equipment found in cleanrooms. IPA can also remove minor oily residues from surfaces.

Solution Container Type Download Datasheet
Isopropanol 4% Cleanroom® LP BOTTLE Download
Isopropanol 10% Cleanroom® LP BOTTLE Download
Isopropanol 10% Cleanroom® LP DRUM Download

Isopropyl Alcohol

Isopropyl alcohol (IPA) is used in IPA vapor drying of wafers. The vapor dryer advantages over spin-rinse dryers include: no water spots, decreased particles on the wafer, reduced chemical consumption and much reduced wafer breakage.

Solution Container Type Download Datasheet
Isopropanol Cleanroom® LP DRUM Download
Isopropanol Cleanroom® MB DRUM Download
Isopropanol Gigabit® Drum Download

MEK

Methyl ethyl ketone (MEK) is a strong solvent that is typically used as a negative photoresist remover.

Solution Container Type Download Datasheet
MEK Cleanroom® LP BOTTLE Download

Methanol

Methanol is a general cleaning solvent and is often a substitute for acetone due to its slower evaporation rate.

Solution Container Type Download Datasheet
Methanol Cleanroom® LP BOTTLE Download

n-Butyl Acetate

Butyl Acetate is used as a solvent in semiconductor processes. It is available in Cleanroom LP (Low Particle) bottles and drums.

Solution Container Type Download Datasheet
Butyl Acetate Cleanroom® LP BOTTLE Download
Butyl Acetate Cleanroom® LP DRUM Download

N-Methylpyrrolidone

N-Methylpyrrolidone (NMP) is a safer alternative to many hazardous solvents. NMP can be used to remove photoresist, clean and dewax silicon wafers, and remove solder flux on printed circuit boards.

Solution Container Type Download Datasheet
N-Methylpyrrolidone Cleanroom® MB BOTTLE Download
N-Methylpyrrolidone Cleanroom® MB DRUM Download

Negative Resist Developer

Negative Resist Developer (NRD) is a rinse used with Fox™ interlayer dielectric.

Solution Container Type Download Datasheet
Negative Resist Developer BOTTLE Download
Negative Resist Developer DRUM Download

PBR

Photoresist Edge Bead Remover (PBR / EBR) eliminates unwanted photoresist at the edges of the wafer.

Solution Container Type Download Datasheet
PBR 40 BOTTLE Download
PBR 50 DRUM Download

Propylene Glycol Methyl Ether Acetate

PGM Acetate (PGMEA) is a high purity process chemical used in photoresist remover applications.

Solution Container Type Download Datasheet
PGM Acetate Cleanroom® MB BOTTLE Download
PGM Acetate Cleanroom® MB DRUM Download

Xylene

Xylene can be used as a negative resist developer in semiconductor applications. Xylene is also mixed with HMDS, then spun on to a wafer to aid in adhesive of photoresist to the silicon wafer.

Solution Container Type Download Datasheet
Xylene Cleanroom® LP BOTTLE Download

Expand for Description and Associated Downloads
GenSolve™

The GenSolve™ product line are organic stripping compositions that remove hydrophilic polymeric organic coating, such as photoresists and their residues from inorganic substrates.

Solution Container Type Download Datasheet
GenSolve™ 310 BOTTLE Download
GenSolve™ 350 BOTTLE Download
GenSolve™ 365 BOTTLE Download
GenSolve™ 475 BOTTLE Download
GenSolve™ 500 DRUM Download
GenSolve™ 501 BOTTLE Download
GenSolve™ 501 DRUM Download
GenSolve™ 670 BOTTLE Download

KMG Electronic Chemicals produces high-purity solvents and other wet process chemicals under a concept we call “basic manufacturing.” As a basic manufacturer, we are vertically integrated to meet the stringent standards of semiconductor, silicon wafer, disk drive and other applications that need the coherent manufacturing, analytical and packaging capabilities of a single supplier.

We supply solvents and solvent blends to many markets, including microelectronic, aerospace, biotechnology, pharmaceutical and optics, for such applications as: